Govt Boonie/3 inch Brim - ERDL 2nd Gen (brown)
MADE IN USA Govt spec construction Boonie Hat (3 inch brim) utilizing original ERDL 2nd Gen. (brown dominate) surplus 100% Cotton ripstop fabric. Yes, this is really 2nd Gen ERDL (brown dominate) surplus fabric, not a re-print.
Environmental Research Development Laboratory (ERDL) designed and adopted their own departmental name for the 1st Gen (green dominate) very rare pattern. The 1st Gen. was issued very sparingly during the Vietnam era and later, the 2nd Gen. (brown dominate) was used very sparingly up to 1981. The pattern design was altered and the brown dominate colors retained which then became the official US Govt Woodland pattern.
Features: black brass screen vents, chin strap with leather adjuster, and brush band.
USA manufactured using the original proprietary assembly equipment. These are the finest manufactured hats you’ll find anywhere on the market today.
MADE IN USA Govt spec construction Boonie Hat (3 inch brim) utilizing original ERDL 2nd Gen. (brown dominate) surplus 100% Cotton ripstop fabric. Yes, this is really 2nd Gen ERDL (brown dominate) surplus fabric, not a re-print.
Environmental Research Development Laboratory (ERDL) designed and adopted their own departmental name for the 1st Gen (green dominate) very rare pattern. The 1st Gen. was issued very sparingly during the Vietnam era and later, the 2nd Gen. (brown dominate) was used very sparingly up to 1981. The pattern design was altered and the brown dominate colors retained which then became the official US Govt Woodland pattern.
Features: black brass screen vents, chin strap with leather adjuster, and brush band.
USA manufactured using the original proprietary assembly equipment. These are the finest manufactured hats you’ll find anywhere on the market today.
MADE IN USA Govt spec construction Boonie Hat (3 inch brim) utilizing original ERDL 2nd Gen. (brown dominate) surplus 100% Cotton ripstop fabric. Yes, this is really 2nd Gen ERDL (brown dominate) surplus fabric, not a re-print.
Environmental Research Development Laboratory (ERDL) designed and adopted their own departmental name for the 1st Gen (green dominate) very rare pattern. The 1st Gen. was issued very sparingly during the Vietnam era and later, the 2nd Gen. (brown dominate) was used very sparingly up to 1981. The pattern design was altered and the brown dominate colors retained which then became the official US Govt Woodland pattern.
Features: black brass screen vents, chin strap with leather adjuster, and brush band.
USA manufactured using the original proprietary assembly equipment. These are the finest manufactured hats you’ll find anywhere on the market today.
